When you continuously throw billions of dollars of funding at a persistent problem, chances are that you’ll eventually succeed. This has been China’s playbook all along to try to find a way to declaw US export restrictions that have virtually eliminated the Asian giant’s access to the cutting-edge Extreme Ultraviolet (EUV) lithography. However, a recent development in the emerging field of silicon photonics has now reportedly advanced China a significant step closer to achieving self-sufficiency in the chip fabrication arena. For the benefit of those who might not be aware, silicon photonics uses light in the infrared spectrum instead of […]
Read full article at https://wccftech.com/china-claims-a-breakthrough-in-silicon-photonics-as-it-tries-to-circumvent-us-export-controls-on-euv-lithography/
