ASML Delivers First 2nm-Generation Low-NA EUV Tool, the Twinscan NXE:3800E
Our avid readers tend to look at microelectronics made using leading edge process technologies, which in case of Intel means usage of High-NA extreme ultraviolet (EUV) lithography a couple of years down the road. But the vast majority of chips that we are going to use in the next couple of years will be made…